We report on high-quality crystalline Fe and Cu thin films prepared by sputtering in low impurity atmosphere (SLIA). According to X-ray photoelectron spectroscopy and secondary ion mass spectroscopy analyses, it was found that the SLIA films contain less impurities compared with those prepared by conventional DC and RF sputtering methods. Such a reduction of impurities markedly enhances the crystal growth and reduces the electrical resistivity.
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Ueda et al. (1994) studied this question.