A silicon atom irradiation technique is proposed to create high-density InGaSb quantum dots (QDs) on a GaAs substrate. This technique irradiates Si atoms immediately before InGaSb QD growth, and the density of QDs with Si atoms is about 100 times higher than that without Si atoms. The high-density InGaSb QDs show long-wavelength photo- and electroluminescence emissions around 1.3 and 1.5μm in the optical communications waveband. An Sb-based QD laser diode (LD) containing an InGaSb QD active layer was fabricated on a GaAs substrate. This Sb-based QD-LD shows a 1.37μm continuous-wave laser emission at room temperature.
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Yamamoto et al. (2005) studied this question.
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