Trends for further developments in vacuum processing of hard disks are discussed. Future tools should offer extended process capabilities such as in situ substrate cleaning, deposition of multilayer structures, fast ramping of substrate temperature, and high energy deposition. The design challenge will be to adapt these steps-many of them already used in other vacuum applications-to the 2-5 s process times common in disk manufacturing.
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Cord et al. (2000) studied this question.
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