Interface lithography: a hybrid lithographic approach for the fabrication of patterns embedded in three-dimensional structures

The aim of this study was to develop a viable technology to realize arbitrary shaped and sized patterns embedded in three-dimensional microstructures. In this paper, we present a new fabrication process based on a binary resist process scheme with the combined use of electron-beam lithography and multi-tilted x-ray lithography. We demonstrate the fabrication of three-dimensional photonic crystal structures with embedded waveguides and the fabrication of a flyover micro-fluidic channel.