The photochemistry of the α‐phenyl‐β,γ‐enones 3–6 has been studied under conditions of direct (λ 300 nm) and triplet‐sensitized irradiation. Upon direct irradiation, 3 exhibits decarbonylation, a 1,3‐acyl shift (1,3‐AS) and an oxa‐di‐π‐methane (ODPM) rearrangement. Under the same conditions, 4 , on the other hand, affords only the ODPM product whereas 5 gives the decarbonylation, 1 ,3‐AS and ODPM products. The formation of the ODPM product of 5 is efficiently quenched by triplet quenchers in contrast to the ODPM products of 3 and 4 , the quantum yields of which are not reduced upon the addition of typical triplet quenchers. Triplet‐sensitized irradiation of 5 leads to the ODPM rearrangement, whereas surprisingly 3 and 4 are unreactive. It is suggested that the ODPM rearrangement, upon direct irradiation of 3 and 4 , proceeds from the S 2 (ππ*) state. The ODPM product formed upon direct irradiation of 5 is thought to be formed from the T 1 (ππ*) state populated by ISC from the S 1 ( n π*) state. Upon direct irradiation, 6 exhibits a reversible 1,3‐AS and in addition ketene formation via an intramolecular 1,5‐H shift. Under conditions of triplet photosensitization, compound 6 appears to be stable. Given the apparently different photochemical behaviour of these constrained compounds, a general reactivity pattern for the direct and sensitized irradiation cannot be defined.
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Koppes et al. (1988) studied this question.
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