We describe the vapor-phase reaction (at room temperature and 40-45% relative humidity) of silicon wafers with the azeotropic mixture of trimethylchlorosilane and tetrachlorosilane. Water contact angle analysis indicates that surfaces become nearly perfectly hydrophobic (thetaA/thetaR > or =176 degrees/> or =176 degrees) after 2 min of reaction. SEM analysis at various reaction times shows the growth of nanofilaments with diameters of approximately 30 nm. X-ray photoelectron spectroscopy of oxidized titanium surfaces that were exposed to the azeotrope vapor indicates that the product is derived from a approximately 10:1 ratio of SiCl4 and (CH3)3SiCl. A mechanism for filament growth is proposed.
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Gao et al. (2007) studied this question.
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