Transport properties and device performance of delta-doped and uniformly doped AlGaAs/GaAs high electron mobility transistors (HEMTs) with identical threshold voltages and gate capacitors are investigated using two-dimensional self-consistent ensemble Monte Carlo simulations. The model includes the effects of real-space transfer and carrier degeneracy, as well as the influence of DX centers and surface states. A one-to-one comparison of simulation results for the two devices demonstrates superior performance for the delta-doped HEMT and provides a physical basis for the observed improvements. In particular, the delta-doped HEMT maintains its superior device performance as gate bias is increased. Reasons for these improvements are reported.>
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Kim et al. (1991) studied this question.
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