Measurement of picometre non-linearity in an optical grating encoder using x-ray interferometry

X-ray interferometry has been used to characterize the non-linearity in an optical encoder displacement measuring system. Traceable measurements of the non-linearity have been made and an estimation of the uncertainty associated with the measurements is given. Cyclic errors with a magnitude of up to 50 pm and periodicity of the encoder system (128 nm) have been recorded.