The thickness of copper films prepared by the rf-sputtering technique has been studied by changing the argon gas pressure and the distance between the target and the substrate. Glass disks with 110-mm diameters were used as substrates. The relative thickness of a film was tested by using a laser beam. The distribution of copper was observed to be centralized as the argon gas pressure was lowered or the distance between the target and the substrate shortened. By using a proper arrangement, the film obtained was smooth enough for optical purposes.
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H. Ratinen (1972) studied this question.
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