An overall CVD process is very complex , with contributions from steps which include gas‐phase reactions, mass transport, surface‐mediated chemistry, and nucleation. Traditional empirical optimization of growth parameters is now being replaced by more rational approaches to understanding the contributions of individual steps to the overall process. Mechanisms of gas‐phase pyrolysis of organometallic CVD precursors and their influences on deposition are reviewed here. Examples given show that spectroscopic techniques can provide valuable clues to factors which affect layer quality.
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Douglas K. Russell (1996) studied this question.
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