Using response surface methodology to optimize the stereolithography process

Purpose – The purpose of this paper is to present a study of the stereolithography apparatus SLA 250‐50 motivated by the introduction of the new epoxy resin AccuGen™. Design/methodology/approach – Several process variables are examined using a Box‐Behnken design and optimization techniques are employed to determine their optimal settings. Findings – The results indicate operating conditions at which high levels of performance can be achieved. Research limitations/implications – The results reported in this research are process specific, however, the methodology employed can be readily applied to different rapid prototyping processes. Practical implications – Effective utilization of the SL process. Originality/value – Quantitative understanding of the process capability in relation to key process variables.