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July 1, 1990Journal of The Electrochemical SocietyOpen Access

Mechanistic Considerations in the Plasma Deposition of Silicon Nitride Films

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JCJ. N. ChiangUniversity of California SystemDHDennis W. HessGeorgia Institute of Technology

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Chiang et al. (1990) studied this question.

synapsesocial.com/papers/6a87fe27c16cbaca05f4c8a9https://doi.org/10.1149/1.2086916
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