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We discuss the actual relevance of thin gap geometry electrodeposition to generate fractal patterns that mimic the morphology of Witten and Sander's diffusion-limited aggregates (DLA). We show that electroless deposition is a good candidate to meet the requirements for diffusion to be the rate limiting step of the growth process. We use the wavelet transform microscope to provide a comparative structural characterization of both experimental electroless deposits and numerical DLA clusters.
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Kuhn et al. (1994) studied this question.
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