Improved images with the scanning photoelectron microscope at the national synchrotron light source

We present recent developments with the scanning photoelectron microscope at beam line X1A (X1‐SPEM) at the National Synchrotron Light Source. It was the first to demonstrate elemental and chemical imaging with primary photoelectrons and achieve submicron resolution [ Appl. Phys. Lett. 56, 1841–1843 (1990)]. Subsequent improvements allow us now to acquire XPS images with lateral resolution approaching 0.1 μm. We have utilized the instrument to examine artificial structures such as microelectronic devices and describe here our preliminary work in the study of photon‐beam‐mediated chemistry on aluminum surfaces.