Sources and methods of repetitively pulsed ion/plasma material treatment

A brief review is presented on repetitively pulsed ‘‘Raduga 1–4’’ ion sources based on evaporation of the cathode material by vacuum arc. Their operation principles and functional possibilities are described. ‘‘Raduga-1,3’’ ion sources provide a formation of one component and multicomponent, not composition-controlled high intensity ion beams. Ion sources ‘‘Raduga-2,4’’ generate energy/composition-controlled multicomponent ion beams. Operation conditions of the sources providing a treatment of the details of complex shape as well as ion plasma treatment of the target are given. Features and prospects of the methods of repetitively pulsed multielement and high concentration implantation are discussed. The method of repetitively pulsed high concentration implantation is realized under ion/plasma operating conditions of the ion source ‘‘Raduga’’ and ion sputtering compensation of the target by plasma deposition.