Automatic Numerical Impedance Matching of Single-Frequency Capacitively Coupled Plasmas in Carbon Tetrafluoride

This is the authors' abstract. We don't add key points for this paper.

The interaction between impedance matching networks and plasmas, characterized by nonlinear dynamics, plays a critical role in optimizing the absorption of power delivered to plasma loads and minimizing the reflected power, particularly in the context of capacitively coupled plasma (CCP) discharge mechanisms. In this study, we examine the discharge mechanism of the electronegative gas CF4under the conditions where the circuit is properly matched. In addition, we incorporated a Boltzmann term to analyze the transition of discharge modes. The results indicate that iterative updates to the parameters of external circuit components can substantially diminish the reflection coefficient and find the optimal matching parameters. Comparison of operations with and without the activated matching network illustrates that plasma discharge is significantly enhanced with the matching network engaged, accompanied by a notable reduction in the time required to attain steady state. Investigation into the transition of discharge modes following matching has been conducted by varying initial voltages and pressures. The methodology presented in this article offers a valuable design reference for matching electronegative gas discharges within CCP systems.