In this work, we investigate the deposition of crystallization-promoting amorphous titania seed layers onto Cu-coated Kapton® HN foils for a subsequent PZT thin film fabrication thereon. Ultrathin TiO2-x layers with controlled stoichiometry were deposited by reactive sputtering at low substrate temperatures. X-ray photoelectron spectroscopy revealed that the Ti4+ ion in the seed layer was stable against Ar+ bombardment-induced reduction while CuO was reduced to Cu2O. Adsorbed moisture, organic solvents and carbon contaminations were quickly removed by Ar+ ion bombardment. (111)-textured PZT was fabricated on seed-layer-coated flexible substrates by means of a RF-modulated plasma jet system.
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Suchaneck et al. (2009) studied this question.
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