p H dependence of synchrotron x-ray induced electroless nickel deposition

We investigated the room temperature electroless nickel deposition on glass, induced by synchrotron x ray. By irradiating electrolytes with intense x ray the onset time for Ni reduction disappears at high electrolyte pH (>6.0) in sharp contrast with conventional electroless deposition. The time for Ni reduction in irradiated solution also decreases with increase in electrolyte pH. Consequently higher reduction rates in alkaline solutions (pH>8.0) raise the Ni nucleation density during deposition, as illustrated by homogeneous and complete coverage of the substrate by nanoparticles within a short period of 1 min. The enhancement in reduction rate is attributed to high redox efficiency of hydrated electrons produced by x ray as well as their redox potential enhancements under higher electrolyte pH conditions.