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a b s t r a c t Al doped ZnO has been explored as a viable alternative to indium thin oxide, which is usually used as transparent electrodes' coverage but is expensive.Homogenous and durable ZnO:Al layers on glass have been obtained in radio frequency magnetron sputtering system by adjusting optimized deposition parameters, using ZnO ceramic target with 2 wt% Al 2 O 3 .Then, after growth process, annealing treatment has been introduced in order to improve the quality of the layers.Structural, electrical and optical properties of the obtained ZnO:Al layers are presented and discussed.From the application point of view, the best results (sheet resistance of 24 /sq and transparency well above 85%) were achieved after annealing in 300 • C.
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Zdyb et al. (2018) studied this question.
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