A successful method to fabricate large-area, microstructured sieve materials (see Figure) from a poly(p-phenylene–vinylene) (PPV) precursor and from poly(3-octylthiophene) (P3OT) is reported. Strong periodicity and a large, defect-free area make this structure extremely interesting for polymer optoelectronics. The underlying mechanism of the self-organized pattern-formation is elaborated in this work.
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Govor et al. (2001) studied this question.