Second derivative Langmuir probe measurements of the electron energy distribution function (EEDF) in an argon–oxygen d.c. gas discharge in conditions close to the optimal for on-axis sputter deposition of YBa2Cu4O8 films have been performed. Taking into account the effect of plasma depletion caused by the electron sink of the probe surface, an extension of Druyvesteyn's method for determination of the plasma potential and the EEDF (respectively, the electron temperature, T and the electron density, n) of the argon–oxygen plasma in the vicinity of the substrate was used. The film composition was monitored as a function of the deposition parameters and related to the relevant plasma characteristics.
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Popov et al. (2005) studied this question.
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