X-ray photoelectron spectroscopy (XPS) of hydrogenated amorphous silicon carbide (a-SixC1-x:H) prepared by the plasma CVD method

The XPS of a-Si x C 1-x :H films prepared by the plasma CVD method from a mixture of silane and methane gases were measured. The separation of the XPS spectra into several peaks revealed the nature of the chemical bonds of silicon and carbon atoms. The coordination of the carbon atom was diamond-like and fourfold in silicon-rich films, while the graphitic threefold coordination was dominant in carbon-rich films. The effect of dilution gas was also investigated by using argon and hydrogen as dilution gases. Films prepared from hydrogen-diluted gas contained more carbon atoms with fourfold coordination than those prepared from argon-diluted gas.