Localized heating induced chemical vapor deposition for one-dimensional nanostructure synthesis

Localized heating has emerged as a viable technique for the site specific synthesis of one-dimensional (1D) nanostructures. By localizing the heat source, the extent of chemical vapor deposition synthesis reactions can be confined to well-defined, microscale regions. Resistive heating has been extensively used to realize highly localized regions of elevated temperature while maintaining a microelectronics-compatible thermal environment elsewhere. Other localized heating methods are being pursued as well. Overall, the approach is simple, flexible, and robust, and offers unique opportunities in 1D nanostructure synthesis, characterization, and integration. Herein, the recent progress of these techniques is reviewed and discussed.