Fabrication of Large‐Scale Patterned Gold‐Nanopillar Arrays on a Silicon Substrate Using Imprinted Porous Alumina Templates

Gold-nanopillar arrays are patterned at predefined positions on a silicon substrate (see figure; scale bar=600 nm). The technique is based on the electrodeposition of gold into nanoporous alumina templates. Prior to anodization the thin aluminum film is indented via an imprinting procedure to define the spots for nanopillar growth. This technique facilitates versatile patterning of metal-nanopillar arrays below the resolution limit of conventional photolithography.