Bias polarity dependence of charge trapping behaviours in La-incorporated hafnium-based dielectric

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Tae-Young Jang, Dong-Hyoub Kim, Jungwoo Kim, Jun Suk Chang, Cuong Nguyen Manh, Musarrat Hasan, Jae Kyeong Jeong, Hoichang Yang, Hokyung Park, Rino Choi; Bias polarity dependence of charge trapping behaviours in La-incorporated hafnium-based dielectric. Appl. Phys. Lett. 22 August 2011; 99 (8): 082905. https://doi.org/10.1063/1.3624922 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioApplied Physics Letters Search Advanced Search |Citation Search