A novel covalence-linked PMMA-SiO(2) hybrid nanodielectrics was prepared by grafting approximately 10 nm PMMA brush onto the SiO(2) (approximately 9 nm) surface, which effectively combines the respective merits of PMMA and SiO(2). As a result, the hybrid nanodielectrics exhibit excellent dielectric performance (e.g., low leakage density (<10(-7) A/cm(2) at 6 MV/cm), high breakdown voltage (7 MV/cm), high capacitance (142 nF/cm(2)), good operational stability, and good compatibility with organic semiconductors), and enable organic field-effect transistors (OFETs) to work with high performance and low voltage. These results may open a way to build ultrathin dielectrics for high performance transistor and circuit, as well as for microelectronics, nanoelectronics, and organic electronics.
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Li et al. (2010) studied this question.
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