A tunneling field-effect transistor with 25 nm metallurgical channel length

A tunneling field-effect transistor with an ultrashort channel-length of 25 nm has been experimentally realized using InAs/AlSb heterostructures. The conduction between the source and the drain is through a sequential process, including tunneling and drift-diffusion mechanisms. According to its operating principle, the transistor is inherently free of the conventional short-channel effects. The results demonstrate a new scheme of building nanometer-scale transistors.