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A novel semiclosed diffusion technique for III-V semiconductors has been developed giving ease of control of the operating and junction depth. The secondary-ion mass-spectrometry atom profiles and carrier-concentration profiles have been used to develop a mechanism involving the temperature dependence of neutral Zn formation. Doubly-ionized interstitials are thought to be the diffusion species.
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Kaźmierski et al. (1984) studied this question.
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