Deposition of Polyaniline Films onto Porous Silicon Layers

The electrochemical deposition of electrically conductive polyaniline films (PANI) onto the surface of porous silicon (PS) layers has been studied using kinetic measurements and infrared spectroscopy. The process of PANI deposition is sensitive to the size of the pores, as well as to the presence of a passive layer at the pore walls and bottoms. Observable polymerization takes place at PS samples processing a pore size of about 4 nm. The results are less good for PS layers with either smaller or larger pores.