Patterning Metallic Nanostructures by Ion-Beam-Induced Dewetting and Rayleigh Instability

Alternative fabrication and patterning of ordered nanostructures has become critically important as the size of devices reaches the nanoscale and the resolution of conventional optical lithography approaches its physical limit. Here, we have developed a simple method that allows one to pattern metallic surface nanostructures with precisely controlled size, spacing, and location using ion-beam-induced dewetting and Rayleigh instability. Predefined patterns by focused ion beam direct-writing were used as the templates for the self-organization of ordered nanostructures. Single or double chains, concentric rings, and two-dimensional arrays of metallic nanoparticles with a well-controlled spacing, diameter, and location were fabricated. This approach represents a maskless process that combines the top-down and bottom-up patterning methods, and no chemical etching or pattern transfer steps are involved. This method can be applied to many metallic systems in constructing complex, higher-order functional nanostructures for numerous applications such as data storage, nanocatalytic systems, and templated fabrication of ordered nanostructures.