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An 18 μm nonmetallized polytetrafluoroethylene (PTFE) film is treated in radio frequency (RF) plasma before a point-to-grid corona charged. The isothermal (170°C) surface potential measurement shows that the surface charge stability is significantly dependent on the plasma sources and treatment conditions. Oxygen (O 2 ), oxygen/helium (O 2 /He) mixture gases and helium (He) plasma treatment enhance the film negative charge stability significantly but not hydrogen (H 2 ) plasma. Electron spectroscopy chemical analysis confirms that this superior negative charge retention for O 2 plasma treatment is a result of the high concentration of oxide groups on the subsurface during the plasma treatment.
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Qiang Chen (2002) studied this question.
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