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November 1, 1989Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

A focused ion beam vacuum lithography process compatible with gas source molecular beam epitaxy

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Authors

LHL. R. HarriottUniversity of VirginiaHTH. TemkinTexas Tech UniversityRHR. A. HammLawrence Livermore National Laboratory

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Cite This Study

Harriott et al. (1989) studied this question.

synapsesocial.com/papers/6a8bca3e06ce16d944b1fc09https://doi.org/10.1116/1.584513
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