We have used the tunneling microscope to observe stacking-fault contrast in conductance and topographic images of the Si(111)-7×{}7 surface as a function of applied gap bias. This contrast is found to be a strong function of the bias, with the maximal contrast occurring near energies where standing-wave formation, between the surface and a buried interface, is predicted in a one-dimensional resonant-tunneling theory. The agreement between experiment and theory indicates that this technique is useful for probing details of buried interfaces formed by surface reconstruction and in heteroepitaxial growth.
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Kubby et al. (1991) studied this question.
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