Deoxyribonucleic acid (DNA) molecules can be selectively adsorbed onto a SiO 2 surface in SiO 2 /SiH pattern, fabricated using photolithography, by adding MgCl 2 to a DNA solution. Since DNA molecules can be adsorbed onto a Si substrate through Mg 2+ , the adsorption of DNA molecules in a SiO 2 /SiH pattern is influenced by the concentration of MgCl 2 and the difference in chemical property between a SiO 2 surface and a SiH surface. The optimum concentration of MgCl 2 at which DNA molecules are selectively adsorbed onto a SiO 2 surface was 0.1 mM.
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Tanaka et al. (2004) studied this question.
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