Plasma ion dynamics following the application of a negative voltage pulse to a two-dimensional trench geometry are computed using a two-fluid model. The potential structure in the sheath both focuses and bunches ions, creating an ion density pulse that travels down the sidewall of the trench. It may be possible to exploit this phenomenon to improve ion implantation in the sidewalls of trenches and holes when using plasma source ion implantation.
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T. E. Sheridan (1995) studied this question.
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