Synthesis and Micropatterning of Semiconducting Polypyrrole Nanofilms by a Two-Step Deposition/Polymerization Process

Micropatterning of polypyrrole films can be achieved via vacuum deposition of monomers, followed by UV-induced selective polymerization (see Figure). This fabrication process minimizes the surface roughness by the separation of monomer deposition and subsequent polymerization. Vacuum deposition has the additional advantage of forming films that have low contamination levels and possess a well-defined thickness and morphology.