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Polarization effects in laser 3D nanolithography are employed to fine-tune the feature sizes in the structuring of photoresist. The vectorial Debye theory is used for modelling and a variation of up to ≈20% in the line width of SZ2080 is shown experimentally for the identical axial extent. This proves polarization to be a variable parameter for voxel-aspect ratio control.
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Rekštytė et al. (2016) studied this question.
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