Sub-100 nm material processing and imaging with a sub-15 femtosecond laser scanning microscope

Low mean powers of 1–10 mW are sufficient for material nanoprocessing when using femtosecond laser microscopes. In particular, near infrared 12 fs laser pulses at peak TW/cm2 intensities, picojoule pulse energies, and 85 MHz repetition rate have been employed. Three-dimensional two-photon lithography as well as direct multiphoton ablation have been performed. Subwavelength sub-100 nm cuts have been realized in photoresists, silicon wafers, glass, polymers, metals, and biological targets. When reducing the mean power to the microwatt range, nondestructive two-photon imaging was performed with the same setup taking advantage of the broad laser emission spectrum. Multiphoton microscopes based on low-cost ultracompact sub-20 fs laser sources may become novel nonlinear optical tools for highly precise nanoprocessing and two-photon imaging.