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Optical techniques were used to extract refractive index and absorption coefficient from thin film transmittance and reflectance data for a family of CVD SIPOS films as‐deposited and subsequent to a 1 hr 1000°C N 2 anneal. Optical measurements in the 0.5–2.5 eV range indicate a dependence of absorption on both oxygen content and annealing conditions.
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Kwark et al. (1982) studied this question.
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