A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported.
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Webb et al. (2007) studied this question.
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