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The fabrication process used in an all-vacuum-deposition thin-metal-film disk will be described. The process consists of planar dc-magnetron sputter deposition of a stainless alloy undercoat onto a 14-in.-diameter AlMg-4 disk substrate, e-beam evaporation of an Fe–Co–Cr alloy magnetic layer at an oblique angle of incidence, planar dc-magnetron sputter deposition of a rhodium overcoat and spray deposition of a liquid lubricant layer. Some mechanical and magnetic performance characteristics of disks, deposited in that fashion, are described.
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Rossi et al. (1984) studied this question.
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