Transparent conducting oxides and semiconductors are microetched with lateral resolution down to 200 nm using a reaction-diffusion process and micropatterned hydrogel stamps, which are both etchant reservoirs and product sinks. The method is suitable for rapid, benchtop prototyping of both bulk and thin-film materials without the need for multistep lithographic processing.
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Smoukov et al. (2006) studied this question.
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