We report on the deposition of in-situ domain aligned magnetostrictive Metglas2605S2 (Fe78Si9B13) thin films by dc magnetron sputtering. The as-deposited thin film has a well oriented magnetic domain structure. A saturation magnetostriction of 30×10−6 is observed, which is comparable to the data published on this material.
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Lu et al. (1997) studied this question.
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