A series of systematic investigations have been made on the correlation between plasma deposition parameters and film properties. Glow discharge optical emission spectroscopy and their spatial distribution have been measured in a constant rf power as a function of the substrate-positive column distance. It has been clarified from the analysis of the depositionrate profiles that the transport of decomposed species compiled into the amorphous network is limited by the diffusion of the decomposed species superimposed by gas drift.
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Hotta et al. (1983) studied this question.
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