Multiscale Simulation of Capacitively Coupled Ar/CHF 3 Discharges Driven by Sawtooth‐Tailored Voltage Waveforms

This is the authors' abstract. We don't add key points for this paper.

Multiscale simulation in capacitively coupled Ar/CHF 3 plasmas driven by sawtooth‐up waveforms are conducted based on a one‐dimensional fluid/Monte‐Carlo (MC) model coupled with an etching profile evolution model. By increasing numbers of consecutive harmonics, N , a transition of the discharge mode from the Drift‐Ambipolar (DA) to an α‐DA hybrid mode can be observed. As the CHF 3 gas admixture increases, the electronegativity initially increases and then decreases, following a similar trend as the absolute value of the DC self‐bias voltage. Moreover, placing the substrate on the grounded electrode of a geometrically symmetric reactor and using a higher N can result in a higher etching rate, since ion fluxes are higher in these scenarios. Additionally, selecting an appropriate gas mixture is also essential.