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March 6, 2025ACS OmegaOpen Access

In Situ TEM Study of Size-Controlled Bi Quantum Dots in an Annealed GaAsBi/AlAs Multiple Quantum Well Structure

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Authors

MSMartynas SkapasCenter for Physical Sciences and TechnologyELE. LunaPaul Drude Institute for Solid State ElectronicsSSSandra StanionytėCenter for Physical Sciences and Technology

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Overview

In situ microscopy study reveals altered bismuth quantum dot formation temperatures in thin semiconductor lamellae, indicating distinct growth mechanisms compared to bulk material.

Key Points

  • To examine real-time bismuth quantum dot formation and structural changes during the thermal annealing of a GaAsBi/AlAs multiple quantum well structure.
  • Grew a heterostructure with two GaAsBi quantum wells inside an AlGaAs parabolic barrier on a semi-insulating GaAs (100) substrate.
  • Prepared and transferred a sample lamella onto an in situ heating holder and heated it up to 650 °C.
  • Monitored dynamic morphological changes continuously using in situ bright-field scanning transmission electron microscopy and compared results to ex-situ bulk annealing.
  • Bismuth quantum dot formation occurred at lower annealing temperatures in thin in situ lamellae than in bulk material.
  • Identified distinct structural evolution mechanisms governing quantum dot formation during in situ thin-foil heating compared to bulk ex-situ annealing.

Cite This Study

Skapas et al. (2025) studied this question.

synapsesocial.com/papers/6a9011d2ebb21526730d30bchttps://doi.org/10.1021/acsomega.4c10631
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