The dark conductivity and Hall mobility of hydrogenated silicon films deposited varying the silane concentration f=SiH4∕(SiH4+H2) in a conventional plasma enhanced chemical vapor deposition system have been investigated as a function of temperature, taking into account their structural properties. The electrical properties have been studied in terms of a structural two-phase model. A clear transition from the electrical transport governed by a crystalline phase, in the range 1%⩽f⩽3%, to that controlled by an amorphous phase, for f>3%, has been evidenced. Some metastable effects of the dark conductivity have been noticed.
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Pinto et al. (2004) studied this question.
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