The present work addresses a systematic approach for measuring the atomic nitrogen radicals using vacuum ultraviolet absorption spectroscopy (VUVAS) in the N2‐SiH4 PECVD processes using alternate plasma concepts. Measurements using VUVAS and RF compensated Langmuir probe reveal that there is significant enhancement in the radical and plasma density when the discharge is operated using the dual frequency hybrid source using the combination of a low and a very high‐frequency source. The behavior of low frequency and dual frequency capacitively coupled plasma (CCP) discharges is experimentally investigated. This study also presents a detailed analysis and effectiveness of the dual frequency hybrid plasmas for the practical applications.
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Sahu et al. (2015) studied this question.
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