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The oxidation of pure nickel containing a dispersion of submicron size ThO2 particles was investigated in the range 600 to 1000C (1112-1832 F). At 600 and 700 C oxidation was described by a parabolic equation. At 950 and 1000C a mixed parabolic relationship (partial control by an interface reaction) applied. Logarithmic oxidation, concurrent with a minimum in the oxidation rate, occurred at intermediate temperatures of 800, 850 and 900 C. The partially controlling interface reaction at 950 and 1000 C is interpreted to be activated adsorption of oxygen at the oxygen-oxide interface. A logarithmic rate law for oxide film formation is derived by considering oxygen adsorption as the controlling process.
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Jones et al. (1965) studied this question.
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