Grating induced micelle alignment of mesostructured silica films

A two-dimensional hexagonal film was produced by the evaporation-induced self-assembly route using the triblock copolymer (EO20PO70EO20) as the structure directing agent. The film was deposited between the walls of a grating of 450nm period and 55nm average line depths by dip coating the substrate in the direction perpendicular to the lines of the grating. In the case where film thicknesses were less than the height of grating walls, the orientation of the micelles was directed by the walls of the grating. Observation of the mesostructured film using atomic force microscopy after chemical etching revealed the internal structure.